Detail publikace

Application of AFM in Microscopy and in Fabrication of Micro/Nanostructures

LOPOUR, F., ŠIKOLA, T., SPOUSTA, J., ŠKODA, D., MATĚJKA, F., KALOUSEK, R.

Originální název

Application of AFM in Microscopy and in Fabrication of Micro/Nanostructures

Typ

článek v časopise - ostatní, Jost

Jazyk

angličtina

Originální abstrakt

In the paper AFM studies of microstructures etched by ion beams into Si and Au surfaces, and AFM local anodic oxidation of Ti thin films is presented. Using the AFM technique the etching limits of inert atoms in production of silicon and silver grids were found. It was proved that the height of Ti oxide lines fabricated by AFM increases linearly with the voltage between a tip and a sample. On the other hand, the half-width of the lines did not depend linearly on this voltage. The results are useful for studies of quantum effects in nanostructures and experiments in fabrication of nanoelectronic devices (e.g. SET).

Klíčová slova v angličtině

AFM fabrication, local anodic oxidation, oxide nanostructures

Autoři

LOPOUR, F., ŠIKOLA, T., SPOUSTA, J., ŠKODA, D., MATĚJKA, F., KALOUSEK, R.

Rok RIV

2002

Vydáno

1. 8. 2002

ISSN

0142-2421

Periodikum

Surface and Interface Analysis

Ročník

34

Číslo

1

Stát

Spojené království Velké Británie a Severního Irska

Strany od

352

Strany do

355

Strany počet

4

BibTex

@article{BUT40889,
  author="Filip {Lopour} and Tomáš {Šikola} and Jiří {Spousta} and David {Škoda} and František {Matějka} and Radek {Kalousek}",
  title="Application of AFM in Microscopy and in Fabrication of Micro/Nanostructures",
  journal="Surface and Interface Analysis",
  year="2002",
  volume="34",
  number="1",
  pages="4",
  issn="0142-2421"
}