Detail publikace

Thin Plasma Polymer Films Of Hexamethyldisiloxane

ČECH, V. PŘIKRYL, R. SALYK, O.

Originální název

Thin Plasma Polymer Films Of Hexamethyldisiloxane

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

Plasma enhanced chemical vapor technology was used to prepare thin polymer film from a vapor of hexamethyldisiloxane (HMDSO) monomer. An influence of deposition conditions on properties of films was observed. Plasma processes were diagnosticated employing the mass spectroscopy. Chemical composition and structure of prepared layers were studied by the infrared spectroscopy (FTIR) and the electron spectroscopy for chemical analysis (ESCA). Surface morphology of films was observed by the scanning electron microscopy (SEM), the profilometer Talystep and the atomic force microscopy (AFM). We measured the surface energy, evaluated the thermal stability using thermogravimetric analysis together with the mass spectroscopy and investigated an adhesion of films to substrates. Some mechanical properties were tested as well.

Klíčová slova

thin film, plasma polymerization

Autoři

ČECH, V.; PŘIKRYL, R.; SALYK, O.

Rok RIV

2000

Vydáno

30. 6. 2000

Nakladatel

UK Praha

Místo

Praha

ISBN

80-85863-59-6

Kniha

Proceedings of WDS 2000

Strany od

318

Strany do

321

Strany počet

4

BibTex

@inproceedings{BUT2561,
  author="Vladimír {Čech} and Ota {Salyk} and Radek {Přikryl}",
  title="Thin Plasma Polymer Films Of Hexamethyldisiloxane",
  booktitle="Proceedings of WDS 2000",
  year="2000",
  pages="4",
  publisher="UK Praha",
  address="Praha",
  isbn="80-85863-59-6"
}