Detail publikace

Precise process monitoring system for anisotropic etching

Kadlec, J., Kolařík, V.

Originální název

Precise process monitoring system for anisotropic etching

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

This paper covers precise monitoring system for monolithic tungsten wire manufacture. This device is designed in order to analyze and control optimal cathode etching process. Main function of this control unit is to control position system, measure etching current and temperature and control cathode etching process.

Klíčová slova v angličtině

Precise monitoring system, monolithic tungsten wire, industrial process.

Autoři

Kadlec, J., Kolařík, V.

Rok RIV

2005

Vydáno

21. 7. 2005

Nakladatel

Technological Institute of Chania

Místo

Greece

ISBN

80-214-3042-7

Kniha

Socrates Workshop Intensive Training Programme in Electronic Systeme Design Proceedings.

Strany od

152

Strany do

154

Strany počet

3

BibTex

@inproceedings{BUT20666,
  author="Jaroslav {Kadlec} and Vladimír {Kolařík}",
  title="Precise process monitoring system for anisotropic etching",
  booktitle="Socrates Workshop Intensive Training Programme in Electronic Systeme Design Proceedings.",
  year="2005",
  pages="3",
  publisher="Technological Institute of Chania",
  address="Greece",
  isbn="80-214-3042-7"
}