Detail publikace

Edge isolation of the silicon solar cells provides by an etching paste

Jiří Hladík, Luboš Jakubka, Ivan Szendiuch

Originální název

Edge isolation of the silicon solar cells provides by an etching paste

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

This paper deals with investigation a process of the edge isolation provides by an etching paste. The local etching is one of many methods suitable for opening a p-n junction and it should substitute mechanical grinding. The main aim of this work was find the optimal parameters for paste dispensing and suitable temperature of paste activation

Klíčová slova

edge isolation, etching paste, shunts, solar cells

Autoři

Jiří Hladík, Luboš Jakubka, Ivan Szendiuch

Rok RIV

2006

Vydáno

30. 3. 2006

Nakladatel

V. Benda

Místo

Prague

ISBN

80-01-03467-4

Kniha

3rd International workshop on teaching in photovoltaics

Číslo edice

1

Strany od

65

Strany do

67

Strany počet

3

BibTex

@inproceedings{BUT19125,
  author="Jiří {Hladík} and Luboš {Jakubka} and Ivan {Szendiuch}",
  title="Edge isolation of the silicon solar cells provides by an etching paste",
  booktitle="3rd International workshop on teaching in photovoltaics",
  year="2006",
  number="1",
  pages="3",
  publisher="V. Benda",
  address="Prague",
  isbn="80-01-03467-4"
}