Detail publikace

An Active Resistor With a Lower Sensitivity to Process Variations, and its Application in Current Reference

KLEDROWETZ, V. HÁZE, J. PROKOP, R. FUJCIK, L.

Originální název

An Active Resistor With a Lower Sensitivity to Process Variations, and its Application in Current Reference

Typ

článek v časopise ve Web of Science, Jimp

Jazyk

angličtina

Originální abstrakt

A novel active resistor circuit offering less sensitivity to process and temperature variations without any extra trimming is proposed. The circuit consists of two accurately matched, high resistance polysilicon (hripoly) resistors and a voltage-controlled MOS resistor, and it is designed for the industrial temperature range (-20 degrees C to 85 degrees C) in the TSMC 180 nm general-purpose process. The actual performance of the circuit is analyzed by using the Corner and Monte Carlo analyses that comprise two thousand samples for the global and local process variations. The maximum error in the resistor value is +/- 6.2%, with the standard deviation of sigma = 12%. The proposed active resistor reduces the maximum error from +/- 15% to +/- 6.2% when the both the process and the temperature variations are considered without trimming. As an application, a transconductor and a current reference based on the novel active resistor are introduced, and their accuracy-related performance is studied.

Klíčová slova

Active resistors; current reference; process variation; transconductor

Autoři

KLEDROWETZ, V.; HÁZE, J.; PROKOP, R.; FUJCIK, L.

Vydáno

29. 10. 2020

Nakladatel

IEEE

Místo

PISCATAWAY

ISSN

2169-3536

Periodikum

IEEE Access

Ročník

8

Číslo

1

Stát

Spojené státy americké

Strany od

197263

Strany do

197275

Strany počet

13

URL

https://ieeexplore.ieee.org/document/9244063

Plný text v Digitální knihovně

http://hdl.handle.net/11012/196478

BibTex

@article{BUT165887,
  author="Vilém {Kledrowetz} and Jiří {Háze} and Roman {Prokop} and Lukáš {Fujcik}",
  title="An Active Resistor With a Lower Sensitivity to Process Variations, and its Application in Current Reference",
  journal="IEEE Access",
  year="2020",
  volume="8",
  number="1",
  pages="197263--197275",
  doi="10.1109/ACCESS.2020.3034790",
  issn="2169-3536",
  url="https://ieeexplore.ieee.org/document/9244063"
}