Detail publikace

The Comprehensive Study of the Thermal Etching Conditions for Partially and Fully Dense Ceramic Samples

SPUSTA, T. JEMELKA, M. MACA, K.

Originální název

The Comprehensive Study of the Thermal Etching Conditions for Partially and Fully Dense Ceramic Samples

Anglický název

The Comprehensive Study of the Thermal Etching Conditions for Partially and Fully Dense Ceramic Samples

Jazyk

en

Originální abstrakt

An alternative approach to the thermal etching of oxide ceramic materials (α-alumina, t-zirconia, and c-zirconia) is presented and compared with the standardly used regime for thermal etching. The given approach was tested on partially (93.8 - 96.3 % t.d.) and fully (99 – 100 % t.d.) dense samples with the criterion of minimizing the density difference after and before etching and with the criterion of clear visibility of grain boundaries. The presented results show, that 900 °C/1 h etching regime is sufficient to reveal the studied microstructure for analysis of the surface of the samples sintered above 1355 °C without affecting the density and without thermal effect on the measured average grain size. The modern approaches as digital analysis of the images can help to reveal the thin grain boundaries after thermal etching at low temperatures.

Anglický abstrakt

An alternative approach to the thermal etching of oxide ceramic materials (α-alumina, t-zirconia, and c-zirconia) is presented and compared with the standardly used regime for thermal etching. The given approach was tested on partially (93.8 - 96.3 % t.d.) and fully (99 – 100 % t.d.) dense samples with the criterion of minimizing the density difference after and before etching and with the criterion of clear visibility of grain boundaries. The presented results show, that 900 °C/1 h etching regime is sufficient to reveal the studied microstructure for analysis of the surface of the samples sintered above 1355 °C without affecting the density and without thermal effect on the measured average grain size. The modern approaches as digital analysis of the images can help to reveal the thin grain boundaries after thermal etching at low temperatures.

Dokumenty

BibTex


@article{BUT160752,
  author="Tomáš {Spusta} and Marek {Jemelka} and Karel {Maca}",
  title="The Comprehensive Study of the Thermal Etching Conditions for Partially and Fully Dense Ceramic Samples",
  annote="An alternative approach to the thermal etching of oxide ceramic materials (α-alumina, t-zirconia, and c-zirconia) is presented and compared with the standardly used regime for thermal etching. The given approach was tested on partially (93.8 - 96.3 % t.d.) and fully (99 – 100 % t.d.) dense samples with the criterion of minimizing the density difference after and before etching and with the criterion of clear visibility of grain boundaries. The presented results show, that 900 °C/1 h etching regime is sufficient to reveal the studied microstructure for analysis of the surface of the samples sintered above 1355 °C without affecting the density and without thermal effect on the measured average grain size. The modern approaches as digital analysis of the images can help to reveal the thin grain boundaries after thermal etching at low temperatures.",
  chapter="160752",
  doi="10.2298/SOS1903257S",
  howpublished="print",
  number="3",
  volume="51",
  year="2019",
  month="july",
  pages="257--264",
  type="journal article in Web of Science"
}