Detail publikace

Fabrication of buried microfluidic channels with observation windows using femtosecond laser photoablation and parylene-C coating

GABLECH, I. SOMER, J. FOHLEROVÁ, Z. SVATOŠ, V. PEKÁREK, J. KURDÍK, S. FENG, J. FECKO, P. PODEŠVA, P. HUBÁLEK, J. NEUŽIL, P.

Originální název

Fabrication of buried microfluidic channels with observation windows using femtosecond laser photoablation and parylene-C coating

Anglický název

Fabrication of buried microfluidic channels with observation windows using femtosecond laser photoablation and parylene-C coating

Jazyk

en

Originální abstrakt

We developed an advanced method for fabricating microfluidic structures comprising channels and inputs/outputs buried within a silicon wafer based on single level lithography. We etched trenches into a silicon substrate, covered these trenches with parylene-C, and selectively opened their bottoms using femtosecond laser photoablation, forming channels and inputs/outputs by isotropic etching of silicon by xenon difluoride vapors. We subsequently sealed the channels with a second parylene-C layer. Unlike in previously published works, this entire process is conducted at ambient temperature to allow for integration with complementary metal oxide semiconductor devices for smart readout electronics. We also demonstrated a method of chip cryo-cleaving with parylene presence that allows for monitoring of the process development. We also created an observation window for in situ visualization inside the opaque silicon substrate by forming a hole in the parylene layer at the silicon backside and with local silicon removal by xenon difluoride vapor etching. We verified the microfluidic chip performance by forming a segmented flow of a fluorescein solution in an oil stream. This proposed technique provides opportunities for forming simple microfluidic systems with buried channels at ambient temperature.

Anglický abstrakt

We developed an advanced method for fabricating microfluidic structures comprising channels and inputs/outputs buried within a silicon wafer based on single level lithography. We etched trenches into a silicon substrate, covered these trenches with parylene-C, and selectively opened their bottoms using femtosecond laser photoablation, forming channels and inputs/outputs by isotropic etching of silicon by xenon difluoride vapors. We subsequently sealed the channels with a second parylene-C layer. Unlike in previously published works, this entire process is conducted at ambient temperature to allow for integration with complementary metal oxide semiconductor devices for smart readout electronics. We also demonstrated a method of chip cryo-cleaving with parylene presence that allows for monitoring of the process development. We also created an observation window for in situ visualization inside the opaque silicon substrate by forming a hole in the parylene layer at the silicon backside and with local silicon removal by xenon difluoride vapor etching. We verified the microfluidic chip performance by forming a segmented flow of a fluorescein solution in an oil stream. This proposed technique provides opportunities for forming simple microfluidic systems with buried channels at ambient temperature.

Dokumenty

BibTex


@article{BUT148977,
  author="Imrich {Gablech} and Jakub {Somer} and Zdenka {Fohlerová} and Vojtěch {Svatoš} and Jan {Pekárek} and Stanislav {Kurdík} and Peter {Fecko} and Jaromír {Hubálek} and Pavel {Neužil}",
  title="Fabrication of buried microfluidic channels with observation windows using femtosecond laser photoablation and parylene-C coating",
  annote="We developed an advanced method for fabricating microfluidic structures comprising channels and inputs/outputs buried within a silicon wafer based on single level lithography. We etched trenches into a silicon substrate, covered these trenches with parylene-C, and selectively opened their bottoms using femtosecond laser photoablation, forming channels and inputs/outputs by isotropic etching of silicon by xenon difluoride vapors. We subsequently sealed the channels with a second parylene-C layer. Unlike in previously published works, this entire process is conducted at ambient temperature to allow for integration with complementary metal oxide semiconductor devices for smart readout electronics. We also demonstrated a method of chip cryo-cleaving with parylene presence that allows for monitoring of the process development. We also created an observation window for in situ visualization inside the opaque silicon substrate by forming a hole in the parylene layer at the silicon backside and with local silicon removal by xenon difluoride vapor etching. We verified the microfluidic chip performance by forming a segmented flow of a fluorescein solution in an oil stream. This proposed technique provides opportunities for forming simple microfluidic systems with buried channels at ambient temperature.",
  address="Springer Heidelberg",
  chapter="148977",
  doi="10.1007/s10404-018-2125-6",
  howpublished="online",
  institution="Springer Heidelberg",
  number="9",
  volume="22",
  year="2018",
  month="september",
  pages="NA--NA",
  publisher="Springer Heidelberg",
  type="journal article in Web of Science"
}