Detail publikace
Deposition and in situ characterization of ultra-thin films
VOBORNÝ, S., KOLÍBAL, M., MACH, J., ČECHAL, J., BÁBOR, P., PRŮŠA, S., SPOUSTA, J., ŠIKOLA, T.
Originální název
Deposition and in situ characterization of ultra-thin films
Anglický název
Deposition and in situ characterization of ultra-thin films
Jazyk
en
Originální abstrakt
Deposition of ultra-thin GaN layers and their analysis using XPS, SIMS, TOF-LEIS.
Anglický abstrakt
Deposition of ultra-thin GaN layers and their analysis using XPS, SIMS, TOF-LEIS.
Dokumenty
BibTex
@inproceedings{BUT11053,
author="Stanislav {Voborný} and Miroslav {Kolíbal} and Jindřich {Mach} and Jan {Čechal} and Petr {Bábor} and Stanislav {Průša} and Jiří {Spousta} and Tomáš {Šikola}",
title="Deposition and in situ characterization of ultra-thin films",
annote="Deposition of ultra-thin GaN layers and their analysis using XPS, SIMS, TOF-LEIS.",
address="EVC",
booktitle="EVC'03 Abstracts",
chapter="11053",
institution="EVC",
year="2003",
month="june",
pages="45",
publisher="EVC",
type="conference paper"
}