Detail publikace

PECVD Characterization During the Deposition of Thin Fluorocarbon Films

BALAŠTÍKOVÁ, R. KRČMA, F. TATOULIAN, M.

Originální název

PECVD Characterization During the Deposition of Thin Fluorocarbon Films

Anglický název

PECVD Characterization During the Deposition of Thin Fluorocarbon Films

Jazyk

en

Originální abstrakt

This presentation focuses on plasma diagnostic of the deposition process during the preparation of the thin film prepared by a PECVD technique. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry.

Anglický abstrakt

This presentation focuses on plasma diagnostic of the deposition process during the preparation of the thin film prepared by a PECVD technique. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry.

Dokumenty

BibTex


@misc{BUT101793,
  author="Radka {Veverková} and František {Krčma} and Michael {Tatoulian}",
  title="PECVD Characterization During the Deposition of Thin Fluorocarbon Films",
  annote="This presentation focuses on plasma diagnostic of the deposition process during the preparation of the thin film prepared by a PECVD technique. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry.",
  address="Eindhoven University",
  booktitle="10th Frontiers in Low Temperature Plasma Diagnostics – Book of Abstracts",
  chapter="101793",
  howpublished="print",
  institution="Eindhoven University",
  year="2013",
  month="april",
  pages="P1-2--P1-2",
  publisher="Eindhoven University",
  type="abstract"
}