Detail publikace

Protection by Deposition of Parylene and SiOx Thin Layers

BALAŠTÍKOVÁ, R. PROCHÁZKA, M. MENČÍK, P. HORÁK, J. PŘIKRYL, R. KRČMA, F.

Originální název

Protection by Deposition of Parylene and SiOx Thin Layers

Anglický název

Protection by Deposition of Parylene and SiOx Thin Layers

Jazyk

en

Originální abstrakt

The aim of this work is protection of archaeological artefacts due to the thin films of parylene and SiOx. Thin films of parylene were prepared by CVD technique and SiOx thin films were prepared by PECVD. This thin films were characterized by various methods, for example by SEM, OTR, XPS and FTIR.

Anglický abstrakt

The aim of this work is protection of archaeological artefacts due to the thin films of parylene and SiOx. Thin films of parylene were prepared by CVD technique and SiOx thin films were prepared by PECVD. This thin films were characterized by various methods, for example by SEM, OTR, XPS and FTIR.

Dokumenty

BibTex


@misc{BUT101790,
  author="Radka {Veverková} and Michal {Procházka} and Přemysl {Menčík} and Jakub {Horák} and Radek {Přikryl} and František {Krčma}",
  title="Protection by Deposition of Parylene and SiOx Thin Layers",
  annote="The aim of this work is protection of archaeological artefacts due to the thin films of parylene and SiOx. Thin films of parylene were prepared by CVD technique and SiOx thin films were prepared by PECVD. This thin films were characterized by various methods, for example by SEM, OTR, XPS and FTIR.",
  address="FCH VUT",
  booktitle="Studentská konference Chemie je život – Sborník abstraktů",
  chapter="101790",
  howpublished="print",
  institution="FCH VUT",
  year="2012",
  month="december",
  pages="96--96",
  publisher="FCH VUT",
  type="abstract"
}