Detail publikace

using thin layer in Thin films in optics and electronic

Originální název

using thin layer in Thin films in optics and electronic

Anglický název

using thin layer in Thin films in optics and electronic

Jazyk

en

Originální abstrakt

Layer technologies are based on the cladding material with a defined thickness on the carrier substrate. Thickness of the layer of thin film technology varies widely from in the result not the same physical properties and constants as in the current quantities of materials. This result is not only used in the sensors but in the entire field of electronics. Thin film technology ensures the sensor's high accuracy, stability, small time constant, reliability, small size and weight and the possibility of integration with semiconductor circuits. The disadvantage of thin-film technology are the increased demands and costs of production technologies - the need to manufacture in a vacuum, etching technology. The big advantage is the smallest temperature dependence of resistance compared to other common technologies. Thin film technologies are mainly used in the implementation of conductive, resistive and dielectric layers. In the field of sensor technology are also creating a special layer. Some materials can be traced and semiconducting properties - has been implemented as thin-film transistor.

Anglický abstrakt

Layer technologies are based on the cladding material with a defined thickness on the carrier substrate. Thickness of the layer of thin film technology varies widely from in the result not the same physical properties and constants as in the current quantities of materials. This result is not only used in the sensors but in the entire field of electronics. Thin film technology ensures the sensor's high accuracy, stability, small time constant, reliability, small size and weight and the possibility of integration with semiconductor circuits. The disadvantage of thin-film technology are the increased demands and costs of production technologies - the need to manufacture in a vacuum, etching technology. The big advantage is the smallest temperature dependence of resistance compared to other common technologies. Thin film technologies are mainly used in the implementation of conductive, resistive and dielectric layers. In the field of sensor technology are also creating a special layer. Some materials can be traced and semiconducting properties - has been implemented as thin-film transistor.

BibTex


@misc{BUT63724,
  author="Doaa {W. F. Yahya}",
  title="using thin layer in Thin films in optics and electronic",
  annote="Layer technologies are based on the cladding material with a defined thickness on the carrier substrate. Thickness of the layer of thin film technology varies widely from   in the result not the same physical properties and constants as in the current quantities of materials. This result is not only used in the sensors but in the entire field of electronics. Thin film technology ensures the sensor's high accuracy, stability, small time constant, reliability, small size and weight and the possibility of integration with semiconductor circuits. The disadvantage of thin-film technology are the increased demands and costs of production technologies - the need to manufacture in a vacuum, etching technology. The big advantage is the smallest temperature dependence of resistance compared to other common technologies.

        Thin film technologies are mainly used in the implementation of conductive, resistive and dielectric layers. In the field of sensor technology are also creating a special layer. Some materials can be traced and semiconducting properties - has been implemented as thin-film transistor.",
  address="doaa",
  chapter="63724",
  howpublished="online",
  institution="doaa",
  year="2009",
  month="december",
  pages="1--15",
  publisher="doaa",
  type="study"
}