Detail publikace

Spectroscopic Monitoring of Plasma Deposition of Silane and Siloxane Based Thin Films

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

Originální název

Spectroscopic Monitoring of Plasma Deposition of Silane and Siloxane Based Thin Films

Anglický název

Spectroscopic Monitoring of Plasma Deposition of Silane and Siloxane Based Thin Films

Jazyk

en

Originální abstrakt

The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharge parameters and the final layer properties will be subject of the following studies.

Anglický abstrakt

The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharge parameters and the final layer properties will be subject of the following studies.

Dokumenty

BibTex 


@article{BUT41506,
  author="Zuzana {Rašková} and Hana {Šormová} and Iveta {Havelková} and František {Krčma} and Jan {Vaněk} and Radek {Přikryl} and Vladimír {Čech}",
  title="Spectroscopic Monitoring of Plasma Deposition of Silane and Siloxane Based Thin Films",
  annote="The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharge parameters and the final layer properties will be subject of the following studies.",
  address="Sloveská Akadémia Ved",
  chapter="41506",
  institution="Sloveská Akadémia Ved",
  journal="Acta Physica Slovaca",
  number="5",
  volume="53",
  year="2003",
  month="september",
  pages="401",
  publisher="Sloveská Akadémia Ved",
  type="journal article - other"
}