Detail publikace

Chemical Vapour Deposition of Gas Sensitive Metal Oxides

VALLEJOS VARGAS, S. DI MAGGIO, F. SHUJAH, T. BLACKMAN, C.

Originální název

Chemical Vapour Deposition of Gas Sensitive Metal Oxides

Typ

článek v časopise ve Web of Science, Jimp

Jazyk

angličtina

Originální abstrakt

This article presents a review of recent research efforts and developments for the fabrication of metal-oxide gas sensors using chemical vapour deposition (CVD), presenting its potential advantages as a materials synthesis technique for gas sensors along with a discussion of their sensing performance. Thin films typically have poorer gas sensing performance compared to traditional screen printed equivalents, attributed to reduced porosity, but the ability to integrate materials directly with the sensor platform provides important process benefits compared to competing synthetic techniques. We conclude that these advantages are likely to drive increased interest in the use of CVD for gas sensor materials over the next decade, whilst the ability to manipulate deposition conditions to alter microstructure can help mitigate the potentially reduced performance in thin films, hence the current prospects for use of CVD in this field look excellent.

Klíčová slova

catalyst; CVD; nanoparticle; metal oxide; sensor; nano; chemical vapor deposition

Autoři

VALLEJOS VARGAS, S.; DI MAGGIO, F.; SHUJAH, T.; BLACKMAN, C.

Vydáno

1. 1. 2016

Nakladatel

MDPI

ISSN

2227-9040

Periodikum

Chemosensors

Ročník

4

Číslo

1

Stát

Švýcarská konfederace

Strany od

1

Strany do

18

Strany počet

18

URL

Plný text v Digitální knihovně

BibTex

@article{BUT170140,
  author="Stella {Vallejos Vargas} and Francesco {Di Maggio} and Tahira {Shujah} and Chris {Blackman}",
  title="Chemical Vapour Deposition of Gas Sensitive Metal Oxides",
  journal="Chemosensors",
  year="2016",
  volume="4",
  number="1",
  pages="1--18",
  doi="10.3390/chemosensors4010004",
  issn="2227-9040",
  url="https://www.mdpi.com/2227-9040/4/1/4"
}