Detail publikace

Diagnostics of the RF Plasma During Organosilicone Thin Layer Deposition

Originální název

Diagnostics of the RF Plasma During Organosilicone Thin Layer Deposition

Anglický název

Diagnostics of the RF Plasma During Organosilicone Thin Layer Deposition

Jazyk

en

Originální abstrakt

Our work deals with the identification of the main spectral lines and bands measured during the plasma deposition using hexamethyldisiloxane (HMDSO) and tetravinylsilane (TVS) as monomers. The deposition processes were carried out in a pulsed regime with a variable relative pulse duration. At first, the pure monomers were used, furthermore, TVS was mixed in various ratios with oxygen. The changes in intensities and characters of spectra with an increasing of pulse duration and with an increasing of oxygen presence in the working gas mixture has been observed and they are different for some groups of the identified species. In the last part of experiment, exhaust gas was investigated by the gas-chromatography coupled with the mass spectrometry (GC-MS) technique. A new compound or fragment has been observed and the possible reaction schemes are given and briefly discussed.

Anglický abstrakt

Our work deals with the identification of the main spectral lines and bands measured during the plasma deposition using hexamethyldisiloxane (HMDSO) and tetravinylsilane (TVS) as monomers. The deposition processes were carried out in a pulsed regime with a variable relative pulse duration. At first, the pure monomers were used, furthermore, TVS was mixed in various ratios with oxygen. The changes in intensities and characters of spectra with an increasing of pulse duration and with an increasing of oxygen presence in the working gas mixture has been observed and they are different for some groups of the identified species. In the last part of experiment, exhaust gas was investigated by the gas-chromatography coupled with the mass spectrometry (GC-MS) technique. A new compound or fragment has been observed and the possible reaction schemes are given and briefly discussed.

BibTex


@inproceedings{BUT15350,
  author="Kamil {Brandejs} and Zuzana {Rašková} and František {Krčma} and Miroslav {Ciganek}",
  title="Diagnostics of the RF Plasma During Organosilicone Thin Layer Deposition",
  annote="Our work deals with the identification of the main spectral lines and
bands measured during the plasma deposition using hexamethyldisiloxane
(HMDSO) and tetravinylsilane (TVS) as monomers. 
The deposition processes were carried out in a pulsed regime with a variable
relative pulse duration. At first, the pure monomers were used,
furthermore, TVS was mixed in various ratios with oxygen.
The changes in intensities and characters of spectra with an
increasing of pulse duration and
with an increasing of oxygen presence in the working gas mixture has been
observed and they are different for some groups of the identified species.
In the last part of experiment, exhaust gas was investigated by
the gas-chromatography coupled with the mass spectrometry
(GC-MS) technique. A new compound or fragment has been observed and the
possible reaction schemes are given and briefly discussed.",
  address="Universite Jofeph Fouriere",
  booktitle="Proceedings of Frontiers in Low Temperature Plasma Diagnostics VI",
  chapter="15350",
  institution="Universite Jofeph Fouriere",
  year="2005",
  month="april",
  pages="61--61",
  publisher="Universite Jofeph Fouriere",
  type="conference paper"
}