FEKT-DME2AOptional specializedDoctoral (3rd cycle)Acad. year: 2017/2018Summer semester1. year of study4 credits
The subject is focused on a study of the microelectronic technologies using seminary and self-study. Students will take-up overview about elemental and advanced methods and techniques, material utilization, and rules for microstructure creation. They will know how to take bearings in areas of the design and fabrication, as well about utilization of nanotechnologies in microelectronics.
Learning outcomes of the course unit
Preview of the mehods and techniques in thin-film and semicoductor technology, design skill of the microstructures and nanostructures using advanced techniques of fabrication.
Mode of delivery
90 % face-to-face, 10 % distance learning
Recommended optional programme components
Recommended or required reading
Planned learning activities and teaching methods
Teaching methods depend on the type of course unit as specified in the article 7 of BUT Rules for Studies and Examinations.
Assesment methods and criteria linked to learning outcomes
Language of instruction
Elemental methods for the thin-film deposition, materials in the thin-film technology, topography design, lithography, anisotropic and isotropic etching of the microstructures, the thermal and chemical oxidation, anodization, impurity diffusion, passive layers, modern methods of the microstructure creation, MEMS, nanotechnology and nanoelectronics, NEMS.
Student is going to familiarize with the elemental and advanced methods and techniques for the microstructures and semiconductor devices fabrication, with materials, rules for their creation and modern nanotechnologies in semiconductor industry.
Type of course unit
39 hours, optionally
Teacher / Lecturer