Course detail

Preparation and properties of thin layers of materials

FCH-DA_PTVAcad. year: 2020/2021

Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, mass spektrometry, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion), spectroscopic ellipsometry and analytical methods (XPS, RBS, ERDA, FTIR).

Learning outcomes of the course unit

Not applicable.

Prerequisites

Not applicable.

Co-requisites

Not applicable.

Recommended optional programme components

Not applicable.

Recommended or required reading

M. Ohring, Materials Science of Thin Films, Academic Press 2002. (EN)
D. Hoffman, B. Singh, J.H. Thomas, Handbook of Vacuum Science and Technology, Academic Press 1998. (EN)
V. L. Mironov, Fundamentals of Scanning Probe Microscopy, NT-MDT 2004. (EN)
H. Bubert, H. Jenett, Surface and Thin Film Analysis, Wiley-VCH, 2002 (EN)

Planned learning activities and teaching methods

Not applicable.

Assesment methods and criteria linked to learning outcomes

Not applicable.

Language of instruction

English

Work placements

Not applicable.

Course curriculum

Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, mass spektrometry, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion), spectroscopic ellipsometry and analytical methods (XPS, RBS, ERDA, FTIR).

Introduction / information sources
Fundamentals of vacuum science
Introduction to plasma physics and chemistry
Physical vapor deposition
Chemical vapor deposition
Plasma-enhanced chemical vapor deposition
Mass spectrometry
Film growth
Film thickness
Scanning probe microscopy
Mechanical properties
Spectroscopic ellipsometry
X-ray photoelectron spectroscopy (XPS)
Rutherford Backscattering Spectrometry (RBS):
Elastic Recoil Detection Analysis (ERDA):
Fourier Transform Infrared Spectroscopy (FTIR):
Case study

Aims

Not applicable.

Classification of course in study plans

  • Programme DKAP_CHM_4_N Doctoral, 1. year of study, winter semester, 0 credits, compulsory-optional
  • Programme DPAP_CHM_4_N Doctoral, 1. year of study, winter semester, 0 credits, compulsory-optional