Publication detail

Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

Original Title

Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films

English Title

Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films

Type

conference paper

Language

en

Original Abstract

The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane.

English abstract

The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane.

Keywords

Plasma thin layer deposition, organosilicone films, optical emission spectroscopy

RIV year

2003

Released

25.06.2003

Publisher

IUPAC

Location

Taormina

Pages from

1

Pages to

6

Pages count

6

BibTex


@inproceedings{BUT8829,
  author="Zuzana {Rašková} and Hana {Šormová} and Iveta {Havelková} and František {Krčma} and Jan {Vaněk} and Radek {Přikryl} and Vladimír {Čech}",
  title="Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films",
  annote="The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios.  The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane.",
  address="IUPAC",
  booktitle="Proceedings of ISPC XVI",
  chapter="8829",
  institution="IUPAC",
  year="2003",
  month="june",
  pages="1",
  publisher="IUPAC",
  type="conference paper"
}