Publication detail

Low Energy Ion Scattering as a depth profiling tool for thin layers - Case of bromine Methanol etched CdTe

ŠIK, O. BÁBOR, P. POLČÁK, J. BELAS, E. MORAVEC, P. GRMELA, L. STANĚK, J.

Original Title

Low Energy Ion Scattering as a depth profiling tool for thin layers - Case of bromine Methanol etched CdTe

English Title

Low Energy Ion Scattering as a depth profiling tool for thin layers - Case of bromine Methanol etched CdTe

Type

journal article

Language

en

Original Abstract

We have investigated the properties of the Te-rich surface layer formed after a bromine-methanol etch of CdTe single crystal by two methods: Angle Resolved X-Ray Photoelectron Spectroscopy (ARXPS) and Low Energy Ion Scattering (LEIS) in the Dynamic mode. We compare the acquisition time of each method. The results showed similar, exponential decay of the Te/Cd ratio to a depth of 6 nm. At the depths higher than 6 nm, the substrate becomes stoichiometric. Dynamic LEIS provided more detailed information about composition at depths lower than the probing depth of ARXPS. The Dynamic LEIS measurements suggest that the composition of the outermost layer of CdTe after bromine-methanol etching consists of CdTe4.

English abstract

We have investigated the properties of the Te-rich surface layer formed after a bromine-methanol etch of CdTe single crystal by two methods: Angle Resolved X-Ray Photoelectron Spectroscopy (ARXPS) and Low Energy Ion Scattering (LEIS) in the Dynamic mode. We compare the acquisition time of each method. The results showed similar, exponential decay of the Te/Cd ratio to a depth of 6 nm. At the depths higher than 6 nm, the substrate becomes stoichiometric. Dynamic LEIS provided more detailed information about composition at depths lower than the probing depth of ARXPS. The Dynamic LEIS measurements suggest that the composition of the outermost layer of CdTe after bromine-methanol etching consists of CdTe4.

Keywords

CdTe; Bromine methanol etching; Thin films; Depth profile; Stoichiometry; Surface analysis; ARXPS; Dynamic LEIS

Released

13.03.2018

Publisher

PERGAMON-ELSEVIER SCIENCE LTD

Location

THE BOULEVARD, LANGFORD LANE, KIDLINGTON, OXFORD OX5 1GB, ENGLAND

Pages from

138

Pages to

144

Pages count

7

URL

BibTex


@article{BUT146607,
  author="Ondřej {Šik} and Petr {Bábor} and Josef {Polčák} and Eduard {Belas} and Pavel {Moravec} and Lubomír {Grmela} and Jan {Staněk}",
  title="Low Energy Ion Scattering as a depth profiling tool for thin layers - Case of bromine Methanol etched CdTe",
  annote="We have investigated the properties of the Te-rich surface layer formed after a bromine-methanol etch of CdTe single crystal by two methods: Angle Resolved X-Ray Photoelectron Spectroscopy (ARXPS) and Low Energy Ion Scattering (LEIS) in the Dynamic mode. We compare the acquisition time of each method. The results showed similar, exponential decay of the Te/Cd ratio to a depth of 6 nm. At the depths higher than 6 nm, the substrate becomes stoichiometric. Dynamic LEIS provided more detailed information about composition at depths lower than the probing depth of ARXPS. The Dynamic LEIS measurements suggest that the composition of the outermost layer of CdTe after bromine-methanol etching consists of CdTe4.",
  address="PERGAMON-ELSEVIER SCIENCE LTD",
  chapter="146607",
  doi="10.1016/j.vacuum.2018.03.014",
  howpublished="online",
  institution="PERGAMON-ELSEVIER SCIENCE LTD",
  number="152",
  year="2018",
  month="march",
  pages="138--144",
  publisher="PERGAMON-ELSEVIER SCIENCE LTD",
  type="journal article"
}