Publication detail

INFLUENCE OF ELECTRON ATTACHMENT ON KINETIC COMPOSITION OF SF6-ARC PLASMA

BARTLOVÁ, M., COUFAL, O.

Original Title

INFLUENCE OF ELECTRON ATTACHMENT ON KINETIC COMPOSITION OF SF6-ARC PLASMA

Type

conference paper

Language

English

Original Abstract

SF6 is considered as one of the best quenching media in HV circuit breakers. To obtain optimum properties of the extinction process, mathematical modeling is employed. This approach necessitates good knowledge of the properties of SF6 which are determined by properties of products of its dissociation and ionization. In order to investigate an SF6 circuit breaker arc during extinction process the composition has to be computed by means of chemical kinetics. There are a lot of chemical reactions among species in the dissociated SF6 system. In our previous model of chemical kinetics we have not taken into account reactions of electron attachment. This process is important for reduction of the concentration of free electrons in the system which influences the breaking capacity of the circuit breaker. In this paper we have improved our previous model by reactions of electron attachment to SF6, F2, and F and compared results of both models.

Keywords

SF6-arc plasma, kinetic composition, electron attachment

Authors

BARTLOVÁ, M., COUFAL, O.

RIV year

2004

Released

10. 11. 2004

Publisher

FEEC, Brno University of Technology

Location

Brno

ISBN

80-7355-024-5

Book

New Trends in Physics, Proc. of the conference

Pages from

156

Pages to

159

Pages count

4

BibTex

@inproceedings{BUT11821,
  author="Milada {Bartlová} and Oldřich {Coufal}",
  title="INFLUENCE OF ELECTRON ATTACHMENT ON KINETIC COMPOSITION OF SF6-ARC PLASMA",
  booktitle="New Trends in Physics, Proc. of the conference",
  year="2004",
  pages="4",
  publisher="FEEC, Brno University of Technology",
  address="Brno",
  isbn="80-7355-024-5"
}