Publication detail

Morphology and structural investigation of aluminum nitride layers prepared by magnetron sputtering

DALLAEVA, D.

Original Title

Morphology and structural investigation of aluminum nitride layers prepared by magnetron sputtering

Type

conference paper

Language

English

Original Abstract

Aluminum nitride thin films were obtained by magnetron sputtering of aluminum target. The films surface was studied by atomic force microscopy and scanning electron microscopy. Using of buffer nitridized layer on the substrate allowed the formation of perfect structure films. Lateral force atomic force microscopy was used to study the morphology heterogeneity. The dependence of films structure on the formation conditions has been defined. The objective of the study is to contribute to the improvement of technological process of dry etching and film deposition.

Keywords

dry etching, epitaxy, substrate, thin film, scanning probe microscopy

Authors

DALLAEVA, D.

RIV year

2013

Released

25. 4. 2013

Publisher

Litera, Tabor 43a, 61200 Brno

Location

Brno University of Technology

ISBN

978-80-214-4695-3

Book

Proceedings of the 19th Conference Student EEICT 2013

Edition

první

Pages from

134

Pages to

138

Pages count

5

BibTex

@inproceedings{BUT99437,
  author="Dinara {Sobola}",
  title="Morphology and structural investigation of aluminum nitride layers prepared by magnetron sputtering",
  booktitle="Proceedings of the 19th Conference Student EEICT 2013",
  year="2013",
  series="první",
  pages="134--138",
  publisher="Litera, Tabor 43a, 61200 Brno",
  address="Brno University of Technology",
  isbn="978-80-214-4695-3"
}