Application of TOF - LEIS and XPS for Surface Studies.

conference paper

English

In the contribution complementary experiments on analysis of surfaces using time-of-flight low energy ion scattering (TOF-LEIS) and x-ray photoelectron spectroscopy (XPS) will be presented. The attention will be paid both to analysis of surfaces and ultra-thin films (e.g. Ga) prepared in situ under UHV conditions. The advantages of simultaneous application of two complementary techniques to surface analysis will be clearly demonstrated.

SIMS, TOF

PRŮŠA, S., ŠIKOLA, T., SPOUSTA, J., VOBORNÝ, S., BÁBOR, P., JURKOVIČ, P., ČECHAL, J.

2002

27. 6. 2001

Vutium

Brno

80-214-1892-3

Materials Structure & Micromechanics of Fracture (MSMF-3)

486

493

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