Publication detail

Current density distribution, noise and non-linearity of thick film resistors

ŠIKULA, J., SEDLÁKOVÁ, V., GRMELA, L., VRBA, R., MELKES, F., ROCAK, D., BELAVIC, D., TACANO, M., HASHIGUCHI, S.

Original Title

Current density distribution, noise and non-linearity of thick film resistors

Type

conference paper

Language

English

Original Abstract

The noise spectroscopy and third harmonic measurements were used to investigate effect of the contact electrode material on the thick film resistor quality and reliability. Strong dependence of nonlinearity on the contact electrode material wasobserved. Thick film resistors with AgPd contactelectrode have higher value of third harmonic voltage,but show better long term stability and reliabilitycomparing with resistors with Ag contact electrode.From the SEM figures we determined, that the sharpness of AgPd contact electrode is approximately 7deg, while Ag contact electrode sharpness is approx. 12deg. It was proved experimentally that noise spectraldensity is proportional to electric field intensity, whilethird harmonic voltage depends on the third power ofelectric field intensity or current density. Modelling ofthe current distribution for two different shapes of metallic contact cross sections was performed. The model shows that the electrode geometry plays dominant role for current distribution in thick film resistor layer. The higher sharpness of metallic contact, the higher current density peak appears in the vicinity of the contact edge. The value of noise or non-linearity is affected by the current density increase in the vicinity of contact - t is not necessary connected with irreversible processes at the contact interface.

Keywords

Noise, Non-linearity, Current density, Thick film

Authors

ŠIKULA, J., SEDLÁKOVÁ, V., GRMELA, L., VRBA, R., MELKES, F., ROCAK, D., BELAVIC, D., TACANO, M., HASHIGUCHI, S.

RIV year

2003

Released

5. 4. 2003

Location

U.S.A.

ISBN

0887-7491

Periodical

Capacitor and Resistor Technology

Year of study

2003

Number

4

State

United States of America

Pages from

112

Pages to

116

Pages count

5

BibTex

@inproceedings{BUT31988,
  author="Josef {Šikula} and Vlasta {Sedláková} and Lubomír {Grmela} and Radimír {Vrba} and František {Melkes} and Dubravka {Rocak} and Darko {Belavic} and Munecazu {Tacano} and Sumihisa {Hashiguchi}",
  title="Current density distribution, noise and non-linearity of thick film resistors",
  booktitle="23rd Capacitor and Resistor Technology Symposium",
  year="2003",
  journal="Capacitor and Resistor Technology",
  volume="2003",
  number="4",
  pages="5",
  address="U.S.A.",
  issn="0887-7491"
}