Publication detail

Reactive Magnetron Sputtering for Passivation of Solar Cells

Ondřej Hégr, Jaroslav Boušek, Jaroslav Sobota, Radim Bařinka, Aleš Poruba

Original Title

Reactive Magnetron Sputtering for Passivation of Solar Cells

English Title

Reactive Magnetron Sputtering for Passivation of Solar Cells

Type

conference paper

Language

en

Original Abstract

We use magnetron sputtering to create of passivation films on the surface of photovoltaic solar cells. For the passivation layer created by this technology is characteristic the high deposition rate with relatively precise layer thickness control.. By reactive magnetron sputtering we deposited the materials currently used in the photovoltaic industry, the SiN (Silicon Nitrid) and SiO2, next the AlN and Al2O3. The aim of work is evaluation of both surface recombination and optical properties of this layers and their comparison with standard solar cells made by Solartec company (Czech republic.

English abstract

We use magnetron sputtering to create of passivation films on the surface of photovoltaic solar cells. For the passivation layer created by this technology is characteristic the high deposition rate with relatively precise layer thickness control.. By reactive magnetron sputtering we deposited the materials currently used in the photovoltaic industry, the SiN (Silicon Nitrid) and SiO2, next the AlN and Al2O3. The aim of work is evaluation of both surface recombination and optical properties of this layers and their comparison with standard solar cells made by Solartec company (Czech republic.

Keywords

magnetron sputtering, passivation layers, solar cells

RIV year

2006

Released

01.01.2006

Publisher

nakl. Z. Novotný

ISBN

80-214-3246-2

Book

IMAPS CS International Conference 2006, Proceedings

Edition number

1

Pages from

526

Pages to

529

Pages count

4

BibTex


@inproceedings{BUT24907,
  author="Ondřej {Hégr} and Jaroslav {Boušek} and Jaroslav {Sobota} and Radim {Bařinka} and Aleš {Poruba}",
  title="Reactive Magnetron Sputtering for Passivation of Solar Cells",
  annote="We use magnetron sputtering to create of passivation films on the surface of photovoltaic solar cells. For the passivation layer created by this technology is characteristic the high deposition rate with relatively precise layer thickness control.. By reactive magnetron sputtering we deposited the materials currently used in the photovoltaic industry, the SiN (Silicon Nitrid) and SiO2, next the AlN and Al2O3. The aim of work is evaluation of both surface recombination and optical properties of this layers and their comparison with standard solar cells made by Solartec company (Czech republic.",
  address="nakl. Z. Novotný",
  booktitle="IMAPS CS International Conference 2006, Proceedings",
  chapter="24907",
  institution="nakl. Z. Novotný",
  number="1",
  year="2006",
  month="january",
  pages="526",
  publisher="nakl. Z. Novotný",
  type="conference paper"
}