Publication detail
Noise and Carge Storage in Nb2O5 Thin Films
SEDLÁKOVÁ, V. ŠIKULA, J. GRMELA, L. HÖSCHEL, P. SITA, Z. HASHIGUCHI, S. TACANO, M.
Original Title
Noise and Carge Storage in Nb2O5 Thin Films
English Title
Noise and Carge Storage in Nb2O5 Thin Films
Type
conference paper
Language
en
Original Abstract
A low frequency noise and DC leakage current measurements have been performed on the MIS structure NbO - Nb2O5 - MnO2. The mechanism of current flow and current noise sources were determined from these measurements. The insulating layer thickness is 50 to 150 nm, relative permittivity about 38. The charge is accumulated not only on NbO and MnO2 electrodes, but also in the Nb2O5 insulating layer. The charge carrier transport is determined by the Poole-Frenkel mechanism and tunnelling in the normal mode (for NbO electrode positive). In this case g-r noise is dominant for Poole-Frenkel mechanism and 1/f noise is dominant for tunnelling.
English abstract
A low frequency noise and DC leakage current measurements have been performed on the MIS structure NbO - Nb2O5 - MnO2. The mechanism of current flow and current noise sources were determined from these measurements. The insulating layer thickness is 50 to 150 nm, relative permittivity about 38. The charge is accumulated not only on NbO and MnO2 electrodes, but also in the Nb2O5 insulating layer. The charge carrier transport is determined by the Poole-Frenkel mechanism and tunnelling in the normal mode (for NbO electrode positive). In this case g-r noise is dominant for Poole-Frenkel mechanism and 1/f noise is dominant for tunnelling.
RIV year
2005
Released
01.01.2005
Publisher
American Institute of Physics
Location
United States of America
ISBN
0-7354-0267-1
Book
Noise and Fluctuations
Pages from
135
Pages to
138
Pages count
4
Documents
BibTex
@inproceedings{BUT16506,
author="Vlasta {Sedláková} and Josef {Šikula} and Lubomír {Grmela} and Pavel {Höschel} and Zdeněk {Sita} and Sumihisa {Hashiguchi} and Munecazu {Tacano}",
title="Noise and Carge Storage in Nb2O5 Thin Films",
annote="A low frequency noise and DC leakage current measurements have been performed on the MIS structure NbO - Nb2O5 - MnO2. The mechanism of current flow and current noise sources were determined from these measurements. The insulating layer thickness is 50 to 150 nm, relative permittivity about 38. The charge is accumulated not only on NbO and MnO2 electrodes, but also in the Nb2O5 insulating layer. The charge carrier transport is determined by the Poole-Frenkel mechanism and tunnelling in the normal mode (for NbO electrode positive). In this case g-r noise is dominant for Poole-Frenkel mechanism and 1/f noise is dominant for tunnelling.",
address="American Institute of Physics",
booktitle="Noise and Fluctuations",
chapter="16506",
institution="American Institute of Physics",
year="2005",
month="january",
pages="135",
publisher="American Institute of Physics",
type="conference paper"
}