Publication detail

Depozice pasivačních vrstev SiNx a SiO2.

Original Title

Depozice pasivačních vrstev SiNx a SiO2.

Czech Title

Depozice pasivačních vrstev SiNx a SiO2.

Language

cs

Original Abstract

In the semiconductor and photovoltaic application, the surface passivation is a very important process for adjustment of silicon surface properties. It brings reduction of recombination centers that arise from previous technology steps. The surface recombination is decreased and the effective lifetime is increased. For passivation layers deposition more methods are possible. The most important method is PECVD (Plasma-Enhanced Chemical Vapor Deposition) and LPCVD (Low-Pressure Chemical Vapor Deposition). In this paper, deposition of the passivation layers by means of reactive magnetron sputtering is dealt.

Czech abstract

In the semiconductor and photovoltaic application, the surface passivation is a very important process for adjustment of silicon surface properties. It brings reduction of recombination centers that arise from previous technology steps. The surface recombination is decreased and the effective lifetime is increased. For passivation layers deposition more methods are possible. The most important method is PECVD (Plasma-Enhanced Chemical Vapor Deposition) and LPCVD (Low-Pressure Chemical Vapor Deposition). In this paper, deposition of the passivation layers by means of reactive magnetron sputtering is dealt.

BibTex


@inproceedings{BUT16434,
  author="Ondřej {Hégr} and Jaroslav {Boušek}",
  title="Depozice pasivačních vrstev SiNx a SiO2.",
  annote="In the semiconductor and photovoltaic application, the surface passivation is a very important process for adjustment of silicon surface properties. It brings reduction of recombination centers that arise from previous technology steps. The surface recombination is decreased and the effective lifetime is increased. For passivation layers deposition more methods are possible. The most important method is PECVD (Plasma-Enhanced Chemical Vapor Deposition) and LPCVD (Low-Pressure Chemical Vapor Deposition). In this paper, deposition of the passivation layers by means of reactive magnetron sputtering is dealt.",
  address="nakl. Z. Novotný",
  booktitle="Mikrosyn. Nové trendy v mikroelektronických systémech a nanotechnologiích",
  chapter="16434",
  institution="nakl. Z. Novotný",
  number="1",
  year="2005",
  month="december",
  pages="111",
  publisher="nakl. Z. Novotný",
  type="conference paper"
}