Publication detail

Metody pasivace povrchů fotovoltaických solárních článků.

Original Title

Metody pasivace povrchů fotovoltaických solárních článků.

Czech Title

Metody pasivace povrchů fotovoltaických solárních článků.

Language

cs

Original Abstract

When talking about surface passivation techniques of photovoltaic solar cells silicon nitrid (SiN) is the most widely used material. One important feature of this is the thermal stability during the deposition. Another improvement of this parameter is possible by utilization of own substrate on which the SiO2 layer is created. Two methods of surface passivation will be described in this article. The first Plasma-Enhanced Chemical-Vapour Deposition system used for SiN deposition and the second creating thermally grown oxid on Si surface will be disscussed. There will be shown that very good thermal stability is possible by combination of both SiN and SiO2. Due to this the recombination in all the volume and on the Si surface is reduced. This leads to higher efficiency of solar cell itself.

Czech abstract

When talking about surface passivation techniques of photovoltaic solar cells silicon nitrid (SiN) is the most widely used material. One important feature of this is the thermal stability during the deposition. Another improvement of this parameter is possible by utilization of own substrate on which the SiO2 layer is created. Two methods of surface passivation will be described in this article. The first Plasma-Enhanced Chemical-Vapour Deposition system used for SiN deposition and the second creating thermally grown oxid on Si surface will be disscussed. There will be shown that very good thermal stability is possible by combination of both SiN and SiO2. Due to this the recombination in all the volume and on the Si surface is reduced. This leads to higher efficiency of solar cell itself.

BibTex


@inproceedings{BUT16134,
  author="Ondřej {Hégr}",
  title="Metody pasivace povrchů fotovoltaických solárních článků.",
  annote="When talking about surface passivation techniques of photovoltaic solar cells silicon nitrid (SiN) is
the most widely used material. One important feature of this is the thermal stability during the
deposition. Another improvement of this parameter is possible by utilization of own substrate on
which the SiO2 layer is created. Two methods of surface passivation will be described in this
article. The first Plasma-Enhanced Chemical-Vapour Deposition system used for SiN deposition
and the second creating thermally grown oxid on Si surface will be disscussed. There will be shown
that very good thermal stability is possible by combination of both SiN and SiO2. Due to this the
recombination in all the volume and on the Si surface is reduced. This leads to higher efficiency of solar cell itself.",
  address="Fakulta elektrotechnická, Západočeská univerzita v Plzni",
  booktitle="Elektrotechnika a informatika 2005",
  chapter="16134",
  howpublished="print",
  institution="Fakulta elektrotechnická, Západočeská univerzita v Plzni",
  year="2005",
  month="november",
  pages="11--14",
  publisher="Fakulta elektrotechnická, Západočeská univerzita v Plzni",
  type="conference paper"
}