Publication detail

Stereometric Analysis of Effects of Heat Stressing on Micromorphology of Si Single Crystals

DALLAEV, R. STACH, S. TALU, S. SOBOLA, D. MÉNDEZ-ALBORES, A. TREJO, G. GRMELA, L.

Original Title

Stereometric Analysis of Effects of Heat Stressing on Micromorphology of Si Single Crystals

Type

journal article in Scopus

Language

English

Original Abstract

The purpose of this work is study of silicon single crystal wafer thermal stability in correlation with three-dimensional (3D) surfacecharacterization using atomic force microscopy (AFM). The samples were heated up to 500 °C for the period of 2 and 4 h. Then thesurfaces of wafers were processed by ion beam. The difference in surface structure of processed and reference samples wasinvestigated. Structural and compositional studies are provided by X-ray photoelectron spectroscopy. Stereometric analysis wascarried out on the basis of AFM-data, for stressed and unstressed samples. The results of stereometric analysis show the correlationof statistical characteristics of surface topography and structure of surface and near-surface area. Characterization techniques incombination with data processing methodology are essential for description of the surface condition. All the extracted topographicparameters and texture features have demonstrated a deeper analysis that can be used for new micro-topography models. (PDF) Stereometric Analysis of Effects of Heat Stressing on Micromorphology of Si Single Crystals.

Keywords

Atomic force microscopy, Si single crystal wafers, Stereometric analysis, Topography, X-ray photoelectron spectroscopy

Authors

DALLAEV, R.; STACH, S.; TALU, S.; SOBOLA, D.; MÉNDEZ-ALBORES, A.; TREJO, G.; GRMELA, L.

Released

26. 1. 2019

Publisher

Springer

ISBN

1876-990X

Periodical

Silicon

Year of study

11

Number

1

State

Kingdom of the Netherlands

Pages from

1

Pages to

15

Pages count

15

URL

https://link.springer.com/article/10.1007/s12633-019-0085-4

BibTex

@article{BUT155249,
  author="Rashid {Dallaev} and Sebastian {Stach} and Stefan {Talu} and Dinara {Sobola} and Alia {Méndez-Albores} and Gabriel {Trejo} and Lubomír {Grmela}",
  title="Stereometric Analysis of Effects of Heat Stressing on Micromorphology of Si Single Crystals",
  journal="Silicon",
  year="2019",
  volume="11",
  number="1",
  pages="1--15",
  doi="10.1007/s12633-019-0085-4",
  issn="1876-990X",
  url="https://link.springer.com/article/10.1007/s12633-019-0085-4"
}