Publication detail

PECVD Characterization During the Deposition of Thin Fluorocarbon Films

BALAŠTÍKOVÁ, R. KRČMA, F. TATOULIAN, M.

Original Title

PECVD Characterization During the Deposition of Thin Fluorocarbon Films

Type

abstract

Language

English

Original Abstract

This presentation focuses on plasma diagnostic of the deposition process during the preparation of the thin film prepared by a PECVD technique. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry.

Keywords

PECVD, fluorocarbon thin films, plasma diagnostics

Authors

BALAŠTÍKOVÁ, R.; KRČMA, F.; TATOULIAN, M.

Released

28. 4. 2013

Publisher

Eindhoven University

Location

Eindhoven

Pages from

P1-2

Pages to

P1-2

Pages count

1