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Course detail

Microelectronic technologies

Subjet code : FEKT-DME2
Faculty: Faculty of Electrical Engineering and Communication
Academic year: 2011/2012
Open: Yes
Supervisor: doc. Ing. Jaromír Hubálek, Ph.D.
Department: Department of Microelectronics
Study level: Doctoral
Study form: combined study
Language of instruction: Czech
Number of credits: 4
Completion: examination
Year of study: 1
Semester: summer
Duty: optional specialized

The study programmes with the given course

Objective of the course – aims of the course unit:
Student is going to familiarize with the elemental and advanced methods and techniques for the microstructures and semiconductor devices fabrication, with materials, rules for their creation and modern nanotechnologies in semiconductor industry.
Objective of the course – learning outcomes and competences:
Preview of the mehods and techniques in thin-film and semicoductor technology, design skill of the microstructures and nanostructures using advanced techniques of fabrication.
Prerequisites:
no
Course contents (annotation):
The subject is focused on a study of the microelectronic technologies using seminary and self-study. Students will take-up overview about elemental and advanced methods and techniques, material utilization, and rules for microstructure creation. They will know how to take bearings in areas of the design and fabrication, as well about utilization of nanotechnologies in microelectronics.
Teaching methods and criteria:
Teaching methods depend on the type of course unit as specified in the article 7 of BUT Rules for Studies and Examinations.
Assesment methods and criteria linked to learning outcomes:
oral examine
Course curriculum:
Elemental methods for the thin-film deposition, materials in the thin-film technology, topography design, lithography, anisotropic and isotropic etching of the microstructures, the thermal and chemical oxidation, anodization, impurity diffusion, passive layers, modern methods of the microstructure creation, MEMS, nanotechnology and nanoelectronics, NEMS.
Recommended reading:
H.O. Pierson, Handbook of Chemical Vapor Deposition. William Andrew Publishing, LLC Norwish, NY, USA, 1999, ISBN 0-8155-1432-8
S. Sivaram, Chemical Vapor Deposition. International Thomson Publishing Inc., 1995, ISBN 0-442-01079-6
M.A. Reed and T. Lee, Molecular Nanoelectronics. American Scientific Publisher, 2003, ISBN 1-58883-006-3
MEMS and Nanotechnology Clearinghouse, http://www.memsnet.org
Courtesy Sandia National Laboratories, SUMMiTTM Technologies, www.mems.sandia.gov
Michael Kraft: Micromachined Inertial Sensors Recent Developments at BSAC, prezentace, Berkeley Sensor &Actuator Center, California,USA
C.T. Leondes, MEMS/NEMS Handbook: Techniques and Applications, Vol. 1-5. Springer Science, 2006
H.S. Nalez, Handbook of Organic-Inorganic Hybrid Materials and Nanocoposities, Vol. 1-2, American Scientific Publisher, 2003.
TJ. Coutts, Active and Passive Thin Film Device. Academic Press, London 1978, pp.1-858

Type of course unit:
39 hours, optionally
Teacher: doc. Ing. Jaromír Hubálek, Ph.D.