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Original title in Czech: Fyzikální a materiálové inženýrstvíFSIAbbreviation: D-FMIAcad. year: 2015/2016Specialisation: Physical Engineering
Programme: Physical and Materials Engineering
Length of Study: 4 years
Accredited from: Accredited until: 31.12.2020
Profile
The curriculum concentrates on the comprehensive study of materials properties and failure processes from the point of view of physics and physical metallurgy. Students should develop capability to apply their knowledge in inventive manner to new technologies and materials, such as plasma spraying, special methods of thermo-mechanical and thermo-chemical treatment, etc. Special attention is paid to the degradation processes and to the synergetic effects of various materials properties on material failure. The subjects of study are metallic and non-metallic materials, e.g., structural ceramics, polymers, amorphous and nanocrystalline materials and intermetallics. The Ph.D. programme requires proficiency in mathematics and physics at the MSc. degree level obtained from Faculty of Science or Faculty of Mechanical Engineering.
Guarantor
prof. RNDr. Miroslav Liška, DrSc.
Issued topics of Doctoral Study Program
In electron optics when designing electron optical systems consisting from round and quadrupole lenses, their individual optical properties must be known to determine the behavior of given system or to optimize it to fulfill given conditions (position of image, magnification, image rotation, imaging aberrations and aberrations due to misalignment). First investigate the properties of several geometries of lenses (focal distance, aberrations) and their dependence ond their excitation, and try to find their most suitable expression for interpolation between excitations. For more complex systems with more individual lenses develop methods for computation and optimization of systems. Study dependence of optical parameters of lenses with different geometry on exctitation and find the best statment to interpolate data. Develop methodology of calculation of properties in case of complex optical systems.
Tutor: Lencová Bohumila, prof. RNDr., CSc.
Design of electrostatic deflection and correction systems. In electron beam lithography it is necessary to use dynamic focusing and dynamic stigmators to correct the aberrations of deflection system for obtaining an optimum shape of spots. The aim of the thesis is to study the dynamic correctors and to design an optical system for electron beam lithography.
Deflecting electrostatic system consists of 8 electrodes precisely machined and adjusted powered by precise power supplies. Deflection field is changed in case of misalignment of electrodes or due to incorrect voltages. Additional focusing, dipole, quadrupole and hexapole fields appear if the imperfections are present. 3D calculation of electrostatic field must be done if the electrode is shifted or tilted.
- matrix method for computations in electron optics - influence of tolerancing and 5th order aberrations - implementation of the differential algebra method for the computation of aberration coefficients of an arbitrary order
Study plan wasn't generated yet for this year.